Description
CVD Chemical Vapor DepositionConfiguration
CVD (SiO2/SiN); 4 pieces/chamber; single chamber; 3000--6000 angstroms; WPH=30OEM Model Description
MATTSON Aspen II is Etchers & Ashers system. the Aspen II can be used with 8” wafer size. Aspen II is based on a highly reliable and productive system design. It provides proven process capabilities and cost of ownership benefits in high volume manufacturing to chipmakers worldwide.Documents
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MATTSON
ASPEN II
Verified
CATEGORY
Dry / Plasma Etch
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
66491
Wafer Sizes:
6"/150mm
Vintage:
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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MATTSON
ASPEN II
CATEGORY
Dry / Plasma Etch
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
66491
Wafer Sizes:
6"/150mm
Vintage:
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
CVD Chemical Vapor DepositionConfiguration
CVD (SiO2/SiN); 4 pieces/chamber; single chamber; 3000--6000 angstroms; WPH=30OEM Model Description
MATTSON Aspen II is Etchers & Ashers system. the Aspen II can be used with 8” wafer size. Aspen II is based on a highly reliable and productive system design. It provides proven process capabilities and cost of ownership benefits in high volume manufacturing to chipmakers worldwide.Documents
No documents