Description

Metal Etch

Configuration

Software: Envision 2.0-068 Main Chamber - Fixed Gap ESC - Metal Etch ESC - Anodized Aluminum VAT 65 Pressure Controller Leybold Mag1500 High Temp Turbo PLL - DSQ Strip Chamber APM - Atmospheric passivation Heated Paddle (1) Orbital Weld Gas Box (2) - Unit UFC 1200A (2) - Unit 1661 Multiflow (3) - Horiba Z500 (1) - Horiba Z300 (1) - Celerity VC-4900VRH Lam Harmonic arm drives (2) Dry Pumps: Busch BA100 (1) Edwards iQDP80 (1) Edwards iQDP80 w/Leybold WSU501 Blower (1) Chillers: M and W Single Ch TCU - RPCX28A-3.OHE-RNB Remote AC Box Delatech SD101 Wet Scrubber

OEM Model Description

The TCP 9600SE is a high density, low pressure etch system from Lam’s TCP product line. It incorporates the Company’s patented Transformer Coupled Plasma source technology for etching 0.35 micron and smaller geometries. It is used for metal etch applications and is designed to offer customers a reliable, lower cost of ownership solution to their advanced needs. The system operates at lower pressures for improved pattern transfer control and higher plasma density for higher etch rates. It is available as a stand-alone, single wafer tool, or on the Alliance multichamber cluster platform.

Documents

No documents

LAM RESEARCH CORPORATION

TCP 9600SE

Verified

Dry / Plasma Etch

Last Verified: Yesterday

Key Item Details

Condition:

Used

Operational Status:

Unknown

Product ID:

119772

Wafer Sizes:

8"/200mm

Vintage:

Unknown

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

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