Description
No descriptionConfiguration
- Envision software - 6inch / 150mm wafer - Main chamber Oxide etch with ISO Loadlock / chamber. - Gas panel equipped with He, O2, NF3, N2, Ar, CF4, CHF3 Functional test incl Plasma checks - System will be powered on and fully debugged, movie demonstrating automatic handling incl plasma in main etch and ISO process chambers - Bulkhead open cassette configuration Tested LAM dual channel 2080 chiller • Crating for airshipment is includedOEM Model Description
The Rainbow® 4520i system is a single wafer, vacuum load-locked low pressure oxide system with two active processing chambers. It is designed for integrated isotropic/anisotropic profile on high aspect ratio contact and via structures. The Isotropic Module adds isotropic oxide etching capabilities to the existing anisotropic capabilities of the Rainbow 4520, providing excellent aluminum step coverage. The Isotropic Module is incorporated onto the entrance load-lock on the Rainbow 4520, requiring only one additional wafer handling step. Having two chambers on a single machine greatly reduces the possibility of cross contamination between processes, which minimizes wafer breakage and defect densities. The system has a high uptime of ≥ 85% and is capable of isotropic etching for dielectric (oxide) films. The Rainbow® 4520i system has several applications, including contact etch, planarization, via etch, trench mask etch, and pad etch.Documents
No documents
CATEGORY
Dry / Plasma Etch
Last Verified: Today
Key Item Details
Condition:
Used
Operational Status:
Deinstalled
Product ID:
138112
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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LAM RESEARCH CORPORATION
RAINBOW 4520i
CATEGORY
Dry / Plasma Etch
Last Verified: Today
Key Item Details
Condition:
Used
Operational Status:
Deinstalled
Product ID:
138112
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
- Envision software - 6inch / 150mm wafer - Main chamber Oxide etch with ISO Loadlock / chamber. - Gas panel equipped with He, O2, NF3, N2, Ar, CF4, CHF3 Functional test incl Plasma checks - System will be powered on and fully debugged, movie demonstrating automatic handling incl plasma in main etch and ISO process chambers - Bulkhead open cassette configuration Tested LAM dual channel 2080 chiller • Crating for airshipment is includedOEM Model Description
The Rainbow® 4520i system is a single wafer, vacuum load-locked low pressure oxide system with two active processing chambers. It is designed for integrated isotropic/anisotropic profile on high aspect ratio contact and via structures. The Isotropic Module adds isotropic oxide etching capabilities to the existing anisotropic capabilities of the Rainbow 4520, providing excellent aluminum step coverage. The Isotropic Module is incorporated onto the entrance load-lock on the Rainbow 4520, requiring only one additional wafer handling step. Having two chambers on a single machine greatly reduces the possibility of cross contamination between processes, which minimizes wafer breakage and defect densities. The system has a high uptime of ≥ 85% and is capable of isotropic etching for dielectric (oxide) films. The Rainbow® 4520i system has several applications, including contact etch, planarization, via etch, trench mask etch, and pad etch.Documents
No documents