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LAM RESEARCH CORPORATION 2300 VERSYS KIYO45
  • LAM RESEARCH CORPORATION 2300 VERSYS KIYO45
  • LAM RESEARCH CORPORATION 2300 VERSYS KIYO45
  • LAM RESEARCH CORPORATION 2300 VERSYS KIYO45
  • LAM RESEARCH CORPORATION 2300 VERSYS KIYO45
  • LAM RESEARCH CORPORATION 2300 VERSYS KIYO45
  • LAM RESEARCH CORPORATION 2300 VERSYS KIYO45
  • LAM RESEARCH CORPORATION 2300 VERSYS KIYO45
Description
No description
Configuration
LAM Kiyo 45 Chamber Has missing parts
OEM Model Description
The 2300 Versys Kiyo45 is a Reactive Ion Etch (RIE) system from Lam Research, part of the Kiyo Product Family. It is used to shape the electrically active materials of a semiconductor device with high precision and consistency. The Kiyo product family is known for its high-performance capabilities and productivity. The Versys Kiyo45 is used for various applications, including shallow trench isolation, source/drain engineering, high-k/metal gate, FinFET and tri-gate, and multi-patterning. It enables processing at sub-65 nm technology nodes.
Documents

No documents

CATEGORY
Dry / Plasma Etch

Last Verified: Over 60 days ago

Key Item Details

Condition:

Parts Tool


Operational Status:

Deinstalled


Product ID:

97779


Wafer Sizes:

Unknown


Vintage:

Unknown


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

LAM RESEARCH CORPORATION

2300 VERSYS KIYO45

verified-listing-icon
Verified
CATEGORY
Dry / Plasma Etch
Last Verified: Over 60 days ago
listing-photo-6198f18ff320440a86d3957825461c89-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45207/6198f18ff320440a86d3957825461c89/73f281c59e354f21bc41ea0d488e12b8_6dd49c2904154ecda2b9734fd5dc6afa1201a_mw.jpeg
listing-photo-6198f18ff320440a86d3957825461c89-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45207/6198f18ff320440a86d3957825461c89/84271aad9ff34da4b6a636ff75164b43_189af2008d4c419691470e0ed08c6bc91201a_mw.jpeg
listing-photo-6198f18ff320440a86d3957825461c89-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45207/6198f18ff320440a86d3957825461c89/47dffc6898e34cbd8da808d79c678977_0deb65a9592143d4a8ced80527e91e9f1201a_mw.jpeg
listing-photo-6198f18ff320440a86d3957825461c89-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45207/6198f18ff320440a86d3957825461c89/46d8220378364b0c960a3bad86399c8c_295e22c0cf4545b6a1b05f1dfec65189_mw.jpeg
listing-photo-6198f18ff320440a86d3957825461c89-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45207/6198f18ff320440a86d3957825461c89/3757de7ec0354764bb76bccc27487f81_05fc8b67ec694d37a7dba637bc870841_mw.jpeg
listing-photo-6198f18ff320440a86d3957825461c89-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45207/6198f18ff320440a86d3957825461c89/ce588755bc4c449abd703b6a2dc075df_f8cc16e01dfb488dada3951e7802eef4_mw.jpeg
listing-photo-6198f18ff320440a86d3957825461c89-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/45207/6198f18ff320440a86d3957825461c89/ee0bce7831684055962357527c7d10c5_a681f7b66380437cac916c1c3d8d6b2c1201a_mw.jpeg
Key Item Details

Condition:

Parts Tool


Operational Status:

Deinstalled


Product ID:

97779


Wafer Sizes:

Unknown


Vintage:

Unknown


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No description
Configuration
LAM Kiyo 45 Chamber Has missing parts
OEM Model Description
The 2300 Versys Kiyo45 is a Reactive Ion Etch (RIE) system from Lam Research, part of the Kiyo Product Family. It is used to shape the electrically active materials of a semiconductor device with high precision and consistency. The Kiyo product family is known for its high-performance capabilities and productivity. The Versys Kiyo45 is used for various applications, including shallow trench isolation, source/drain engineering, high-k/metal gate, FinFET and tri-gate, and multi-patterning. It enables processing at sub-65 nm technology nodes.
Documents

No documents