
Description
No descriptionConfiguration
No ConfigurationOEM Model Description
The 2300 Kiyo F is part of Lam’s Kiyo product family, which delivers high-performance capabilities for conductor etching in semiconductor devices. Conductor etch helps shape the electrically active materials used in the parts of a semiconductor device, and even a slight variation in these miniature structures can impact device performance. The Kiyo F series offers superior uniformity and repeatability, high productivity with low defectivity on multi-film stacks, improved critical dimension uniformity, atomic-scale variability control with production-worthy throughput, and upgradability for low cost of ownership over several device generations.Documents
No documents
CATEGORY
Dry / Plasma Etch
Last Verified: 4 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
148446
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
LAM RESEARCH CORPORATION
2300 KIYO F
CATEGORY
Dry / Plasma Etch
Last Verified: 4 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
148446
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
No ConfigurationOEM Model Description
The 2300 Kiyo F is part of Lam’s Kiyo product family, which delivers high-performance capabilities for conductor etching in semiconductor devices. Conductor etch helps shape the electrically active materials used in the parts of a semiconductor device, and even a slight variation in these miniature structures can impact device performance. The Kiyo F series offers superior uniformity and repeatability, high productivity with low defectivity on multi-film stacks, improved critical dimension uniformity, atomic-scale variability control with production-worthy throughput, and upgradability for low cost of ownership over several device generations.Documents
No documents