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Description
Plasma EtchConfiguration
Install Type: Thru-the-wall (TTW) Status Lamp System software (App): Envision ver1.5.1 SECS I Interface Cassette Interface: (2) Hine 38F indexers Electrostatic Chuck (ESC) Endpoint Detection: Monochromator 405nm / 520nm Turbo: Seiko Seiki STP H200C RF Match Type: LAM On-board RF Generators: No RF Generator: ENI OEM-650A RF Hours: 402056 Remote RF Cart: No ATM Passivation Module: No Plasma LLK (PLL): No High Conductance Manifold: No Gas Box: Remote gas Box: No Orbitally welded GB: Yes Backside cooling MFC: Unit 1250A Gases: #1: N2, 200 sccm, Unit 1200A #2: CHF3, 50 sccm, Unit 1200A #3: N2, 300 sccm, Aera #4: N2, 500 sccm, Unit UFC 1660 #5: CF4, 150 sccm, Unit 1200A #6: SF6, 150 sccm, Unit 1200A #7: He, 1 slm, Unit UFC 1660 #8: O2, 200 sccm, Unit UFC 1660 Pump: Heated pumping manifolds: No Pump controller: iQ Series Entrance / Exit: Edwards iQDP-40 Main: Edwards iQDP-80 Chiller(s): (2) SMC HRS018-WN-20-M On-board AC Distribution type: Fused Power requirements: 208VAC, 3-Phase, 5-WireOEM Model Description
The LRC Rainbow Etchers are fully automated, in-line, single-wafer plasma/RIE etching systems that processes 6-inch, or 8-inch wafers and features top or/and bottom powered electrode plate, programmable electrode spacing, and automatic noncontact wafer alignment and placement. Unique RF match networks are located at the upper and lower electrodes for programmable switching between plasma and RIE modes. Designed for continuous operation, the LRC Rainbow etchers are computer-controlled, allowing either manual or automatic control. The Lam Rainbow 44XX Series can be for Tungsten silicide, Silicon nitride, polysilicon ,oxide, Crystallise Si etc.Documents
No documents
CATEGORY
Dry / Plasma Etch
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
63314
Wafer Sizes:
8"/200mm
Vintage:
1993
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Similar Listings
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LAM RESEARCH CORPORATION
RAINBOW 4420
CATEGORY
Dry / Plasma Etch
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
63314
Wafer Sizes:
8"/200mm
Vintage:
1993
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Plasma EtchConfiguration
Install Type: Thru-the-wall (TTW) Status Lamp System software (App): Envision ver1.5.1 SECS I Interface Cassette Interface: (2) Hine 38F indexers Electrostatic Chuck (ESC) Endpoint Detection: Monochromator 405nm / 520nm Turbo: Seiko Seiki STP H200C RF Match Type: LAM On-board RF Generators: No RF Generator: ENI OEM-650A RF Hours: 402056 Remote RF Cart: No ATM Passivation Module: No Plasma LLK (PLL): No High Conductance Manifold: No Gas Box: Remote gas Box: No Orbitally welded GB: Yes Backside cooling MFC: Unit 1250A Gases: #1: N2, 200 sccm, Unit 1200A #2: CHF3, 50 sccm, Unit 1200A #3: N2, 300 sccm, Aera #4: N2, 500 sccm, Unit UFC 1660 #5: CF4, 150 sccm, Unit 1200A #6: SF6, 150 sccm, Unit 1200A #7: He, 1 slm, Unit UFC 1660 #8: O2, 200 sccm, Unit UFC 1660 Pump: Heated pumping manifolds: No Pump controller: iQ Series Entrance / Exit: Edwards iQDP-40 Main: Edwards iQDP-80 Chiller(s): (2) SMC HRS018-WN-20-M On-board AC Distribution type: Fused Power requirements: 208VAC, 3-Phase, 5-WireOEM Model Description
The LRC Rainbow Etchers are fully automated, in-line, single-wafer plasma/RIE etching systems that processes 6-inch, or 8-inch wafers and features top or/and bottom powered electrode plate, programmable electrode spacing, and automatic noncontact wafer alignment and placement. Unique RF match networks are located at the upper and lower electrodes for programmable switching between plasma and RIE modes. Designed for continuous operation, the LRC Rainbow etchers are computer-controlled, allowing either manual or automatic control. The Lam Rainbow 44XX Series can be for Tungsten silicide, Silicon nitride, polysilicon ,oxide, Crystallise Si etc.Documents
No documents
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Dry / Plasma EtchVintage: 0Condition: UsedLast Verified:Over 60 days agoPREFERRED
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