Description
Lam AutoEtch 590, the most popular model for 4 to 6 inch wafer plasma etcher. The gap between top and bottom electrode is adjustable, which make the etcher more flexible with much better performance.Configuration
Main Etcher Materials: SiO2 etc.OEM Model Description
The AutoEtch 590 is part of Lam Research Corporation’s AutoEtch product line, which was first introduced in January 1982. The AutoEtch series includes the 490, 590, and 690 series, designed for etching polysilicon, oxide, and aluminum film applications, respectively. The AutoEtch 590 is suitable for film applications involving line-widths of 0.8 microns or greater and wafer sizes of six inches or smaller. Despite being over fourteen years old, the AutoEtch series has undergone continued improvements in both reliability and performance.Documents
No documents
CATEGORY
Dry / Plasma Etch
Last Verified: 8 days ago
Key Item Details
Condition:
Refurbished
Operational Status:
Unknown
Product ID:
138623
Wafer Sizes:
4"/100mm, 6"/150mm
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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LAM RESEARCH CORPORATION
AUTOETCH 590
CATEGORY
Dry / Plasma Etch
Last Verified: 8 days ago
Key Item Details
Condition:
Refurbished
Operational Status:
Unknown
Product ID:
138623
Wafer Sizes:
4"/100mm, 6"/150mm
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Lam AutoEtch 590, the most popular model for 4 to 6 inch wafer plasma etcher. The gap between top and bottom electrode is adjustable, which make the etcher more flexible with much better performance.Configuration
Main Etcher Materials: SiO2 etc.OEM Model Description
The AutoEtch 590 is part of Lam Research Corporation’s AutoEtch product line, which was first introduced in January 1982. The AutoEtch series includes the 490, 590, and 690 series, designed for etching polysilicon, oxide, and aluminum film applications, respectively. The AutoEtch 590 is suitable for film applications involving line-widths of 0.8 microns or greater and wafer sizes of six inches or smaller. Despite being over fourteen years old, the AutoEtch series has undergone continued improvements in both reliability and performance.Documents
No documents