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LAM RESEARCH CORPORATION 2300 VERSYS
    Description
    Plasma processing system
    Configuration
    No Configuration
    OEM Model Description
    The 2300 Versys is a part of Lam’s 2300 etch series, which is a low-risk solution for sub-100-nm volume production on 300-mm substrates. It has a compact design that reduces floor space while providing full service access. The Versys conductor etch systems rely on Lam’s Transformer Coupled Plasma™ source and deliver superior performance. It also reduces cost of ownership to compete with the lowest cost systems in the industry.
    Documents

    No documents

    verified-listing-icon

    Verified

    CATEGORY
    Dry / Plasma Etch

    Last Verified: 2 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    154596


    Wafer Sizes:

    12"/300mm


    Vintage:

    Unknown


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
    View All
    LAM RESEARCH CORPORATION 2300 VERSYS

    LAM RESEARCH CORPORATION

    2300 VERSYS

    Dry / Plasma Etch
    Vintage: 0Condition: Used
    Last Verified2 days ago

    LAM RESEARCH CORPORATION

    2300 VERSYS

    verified-listing-icon
    Verified
    CATEGORY
    Dry / Plasma Etch
    Last Verified: 2 days ago
    listing-photo-4ee58e83bad443a7b6db58793d902fed-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    154596


    Wafer Sizes:

    12"/300mm


    Vintage:

    Unknown


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    Plasma processing system
    Configuration
    No Configuration
    OEM Model Description
    The 2300 Versys is a part of Lam’s 2300 etch series, which is a low-risk solution for sub-100-nm volume production on 300-mm substrates. It has a compact design that reduces floor space while providing full service access. The Versys conductor etch systems rely on Lam’s Transformer Coupled Plasma™ source and deliver superior performance. It also reduces cost of ownership to compete with the lowest cost systems in the industry.
    Documents

    No documents

    Similar Listings
    View All
    LAM RESEARCH CORPORATION 2300 VERSYS

    LAM RESEARCH CORPORATION

    2300 VERSYS

    Dry / Plasma EtchVintage: 0Condition: UsedLast Verified:2 days ago