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Description
No descriptionConfiguration
Type: 300mm M712 mainframe M711 setup one Etch chamber Software revision: 1.07 PMv.02.16M Etcher, 12" (3) Cassettes Positions SECS II Interface: HSMS Neslab coolflow III Chiller Power supply: 208 VAC, 3-Phase, 50/60 Hz Mainframe: Robot P/N: CR-712V HITACHI 3 position Loader Chamber: ESC Type: Bipolar Endpoint type: Hitachi EPD monitor ePMv02.16M SHIMAZU EC TMP 3203LMC-K1 EC TMP Controller DAIHEN ES7-IIA EC Source generator PEARL CF-500-400K EC Bias generator Gas configuration: Line / EC1 / Strip 1 / Ar 2 / C12 3 / SF6 4 / HBr 5 / CF3 6 / CH4 7 / NF3 8 / O2 9 / N2 10/ SF6 11/ C12 12/ O2OEM Model Description
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Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
65310
Wafer Sizes:
12"/300mm
Vintage:
2006
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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HITACHI
M 712
CATEGORY
Dry / Plasma Etch
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
65310
Wafer Sizes:
12"/300mm
Vintage:
2006
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
Type: 300mm M712 mainframe M711 setup one Etch chamber Software revision: 1.07 PMv.02.16M Etcher, 12" (3) Cassettes Positions SECS II Interface: HSMS Neslab coolflow III Chiller Power supply: 208 VAC, 3-Phase, 50/60 Hz Mainframe: Robot P/N: CR-712V HITACHI 3 position Loader Chamber: ESC Type: Bipolar Endpoint type: Hitachi EPD monitor ePMv02.16M SHIMAZU EC TMP 3203LMC-K1 EC TMP Controller DAIHEN ES7-IIA EC Source generator PEARL CF-500-400K EC Bias generator Gas configuration: Line / EC1 / Strip 1 / Ar 2 / C12 3 / SF6 4 / HBr 5 / CF3 6 / CH4 7 / NF3 8 / O2 9 / N2 10/ SF6 11/ C12 12/ O2OEM Model Description
None ProvidedDocuments
No documents