Description
No descriptionConfiguration
No ConfigurationOEM Model Description
NANO is a low-pressure plasma system. The cabinets of the system vary depending on the components and options chosen by the user. The chamber volume of the system also varies depending on the version selected. The power supply for the table-top system is 230 V AC, while the standalone system requires 400 V AC with 3 phases. This system is designed to provide efficient and reliable plasma processing for a variety of applications.Documents
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DIENER ELECTRONIC
NANO
Verified
CATEGORY
Dry / Plasma Etch
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
82085
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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DIENER ELECTRONIC
NANO
CATEGORY
Dry / Plasma Etch
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
82085
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
No ConfigurationOEM Model Description
NANO is a low-pressure plasma system. The cabinets of the system vary depending on the components and options chosen by the user. The chamber volume of the system also varies depending on the version selected. The power supply for the table-top system is 230 V AC, while the standalone system requires 400 V AC with 3 phases. This system is designed to provide efficient and reliable plasma processing for a variety of applications.Documents
No documents