Description

Equipment description: SiO2, SiN, POLY etching

Configuration

No Configuration

OEM Model Description

The AMAT P5000 Etch is a magnetically enhanced reactive ion etching system (MERIE) with two functional process chambers (Chambers B & C). P5000 Chamber B is primarily used for etching silicon based dielectrics (silicon dioxide, silcon nitride, etc.) and some carbon based compounds (resist, poly imide, etc) while chamber C is mainly used for silicon etching with high selectivity to underlying dielectric such as silicon dioxide. The system can process only 4" wafers. Pieces have to be attached to a 4" wafer. Though the process chamber processes one wafer at a time, up to 25 wafers can be loaded per batch.

Documents

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APPLIED MATERIALS (AMAT)

P5000 ETCH

Verified

Dry / Plasma Etch

Last Verified: Today

Key Item Details

Condition:

Used

Operational Status:

Unknown

Product ID:

139508

Wafer Sizes:

6"/150mm, 8"/200mm

Vintage:

Unknown

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

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