Description
No descriptionConfiguration
DRY ETCHEROEM Model Description
For etching advanced conducting films, Applied launched DPS systems in fiscal 2001, the Metal Etch DPS™ II and Silicon Etch DPS™ II Centura systems, offering customers the technology, productivity and reliability required for 100nm and below processing.Documents
No documents
CATEGORY
Dry / Plasma Etch
Last Verified: 4 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
140493
Wafer Sizes:
6"/150mm
Vintage:
2001
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
CENTURA METAL DPS II
CATEGORY
Dry / Plasma Etch
Last Verified: 4 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
140493
Wafer Sizes:
6"/150mm
Vintage:
2001
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
DRY ETCHEROEM Model Description
For etching advanced conducting films, Applied launched DPS systems in fiscal 2001, the Metal Etch DPS™ II and Silicon Etch DPS™ II Centura systems, offering customers the technology, productivity and reliability required for 100nm and below processing.Documents
No documents