For etching advanced conducting films, Applied launched DPS systems in fiscal 2001, the Metal Etch DPS™ II and Silicon Etch DPS™ II Centura systems, offering customers the technology, productivity and reliability required for 100nm and below processing.

Applied Materials is committed to accelerating this new PPACt playbook for our customers and partners. We have the broadest and deepest portfolio of products for delivering PPACt innovations to the market. This portfolio encompasses the ability to create and deposit, shape and remove, modify, analyze, and connect materials and devices in new ways. We are unique in having a broad suite of process technology and metrology capabilities under one roof, and we have highly differentiated silicon and packaging lab capabilities. Our Integrated Materials Solutions co-optimize materials deposition, removal, modification, and analysis to create new materials and engineer new structures for high-performance, low-power chips at leading-edge nodes.

APPLIED MATERIALS (AMAT)

CENTURA METAL DPS II

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CENTURA METAL DPS II

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APPLIED MATERIALS (AMAT)

CENTURA METAL DPS II

APPLIED MATERIALS (AMAT)

CENTURA METAL DPS II

APPLIED MATERIALS (AMAT)

CENTURA METAL DPS II

APPLIED MATERIALS (AMAT)

CENTURA METAL DPS II

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APPLIED MATERIALS (AMAT)

CENTURA METAL DPS II

APPLIED MATERIALS (AMAT)

CENTURA METAL DPS II

APPLIED MATERIALS (AMAT)

CENTURA METAL DPS II

APPLIED MATERIALS (AMAT)

CENTURA METAL DPS II