Description

• MxP etch chamber • Uni-body wall • Uni-lid 0020-31831 • Extended cathode ESC process kit • 1 torr process manometer • Heated pumpstack with VAT gate valve HRTV throttle • 0040-31911 ESC cathode • RF match 0010-12090 • Edward turbo (requires overhaul) • Magnet driver • Turbo controller and cable • Slit actuator and door

Configuration

No Configuration

OEM Model Description

This multi-chamber machine consists of one central transfer module with a magnetic vacuum robot surrounded by multiple processing stations and chambers. Chambers types include: MXP+, MXP Poly, and orienters. Applications of Centura MXP include etch, CVD, ALD, epitaxy, photomask fabrication, plasma doping, plasma nitridation, PVD, and RTP. In July 1994, Applied Materials introduced the Metal Etch MxP Centura, which combines sub-0.5 micron process technology with improved throughput.

Documents

No documents

APPLIED MATERIALS (AMAT)

CENTURA MxP

Verified

Dry / Plasma Etch

Last Verified: 18 days ago

Key Item Details

Condition:

Parts Tool

Operational Status:

Unknown

Product ID:

139659

Wafer Sizes:

8"/200mm

Vintage:

Unknown

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

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