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APPLIED MATERIALS (AMAT) CENTURA METAL DPS
  • APPLIED MATERIALS (AMAT) CENTURA METAL DPS
  • APPLIED MATERIALS (AMAT) CENTURA METAL DPS
  • APPLIED MATERIALS (AMAT) CENTURA METAL DPS
  • APPLIED MATERIALS (AMAT) CENTURA METAL DPS
  • APPLIED MATERIALS (AMAT) CENTURA METAL DPS
  • APPLIED MATERIALS (AMAT) CENTURA METAL DPS
  • APPLIED MATERIALS (AMAT) CENTURA METAL DPS
  • APPLIED MATERIALS (AMAT) CENTURA METAL DPS
  • APPLIED MATERIALS (AMAT) CENTURA METAL DPS
  • APPLIED MATERIALS (AMAT) CENTURA METAL DPS
Description
No description
Configuration
Centura I DPS METEL Rev.0 2-ETCH / 2-ASP 6 inch
OEM Model Description
Two new etch systems were launched in 1996 for HDP etching of metal and silicon films, using AMAT's DPS (Decoupled Plasma Source) technology. The DPS Metal Etch Centura and DPS Silicon Etch Centura are aimed at very advanced applications, primarily for deep submicron devices (0.25-micron).
Documents
CATEGORY
Dry / Plasma Etch

Last Verified: Over 60 days ago

Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

66325


Wafer Sizes:

6"/150mm


Vintage:

Unknown


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

APPLIED MATERIALS (AMAT)

CENTURA METAL DPS

verified-listing-icon
Verified
CATEGORY
Dry / Plasma Etch
Last Verified: Over 60 days ago
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listing-photo-b079eca469cc46409545c9e7288d7deb-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1223/b079eca469cc46409545c9e7288d7deb/43ebcc51fa21420997754e7460815bff_16e5ae8575d34dda88328ceea99377041201a_mw.jpeg
Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

66325


Wafer Sizes:

6"/150mm


Vintage:

Unknown


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No description
Configuration
Centura I DPS METEL Rev.0 2-ETCH / 2-ASP 6 inch
OEM Model Description
Two new etch systems were launched in 1996 for HDP etching of metal and silicon films, using AMAT's DPS (Decoupled Plasma Source) technology. The DPS Metal Etch Centura and DPS Silicon Etch Centura are aimed at very advanced applications, primarily for deep submicron devices (0.25-micron).
Documents