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KLA 2835
    Description
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    Configuration
    No Configuration
    OEM Model Description
    The 2835 is a broadband plasma defect inspection system designed for optical patterned defect inspection. It is capable of discovering and monitoring yield-critical defects on devices with design nodes of 45nm or greater, including logic, memory, and specialty devices. The system is equipped with selectable wavelength illumination, imaging pixels, optic modes, and advanced algorithms for noise suppression and defect separation. This provides cost-effective, inline inspection control for critical levels. The 2835 is suitable for inline defect discovery and monitoring, hotspot discovery, engineering analysis, process window qualification, and photo cell monitoring.
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    KLA

    2835

    verified-listing-icon

    Verified

    CATEGORY

    Defect Inspection
    Last Verified: Over 60 days ago
    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    12840

    Wafer Sizes:

    12"/300mm

    Vintage:

    Unknown

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    KLA 2835
    KLA2835Defect Inspection
    Vintage: 0Condition: Used
    Last VerifiedOver 60 days ago

    KLA

    2835

    verified-listing-icon

    Verified

    CATEGORY

    Defect Inspection
    Last Verified: Over 60 days ago
    listing-photo-44c914f57040ad3ebc8f9a18847287ed073363863c6fdaf860de81d12bbcf900-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    12840

    Wafer Sizes:

    12"/300mm

    Vintage:

    Unknown

    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    No Configuration
    OEM Model Description
    The 2835 is a broadband plasma defect inspection system designed for optical patterned defect inspection. It is capable of discovering and monitoring yield-critical defects on devices with design nodes of 45nm or greater, including logic, memory, and specialty devices. The system is equipped with selectable wavelength illumination, imaging pixels, optic modes, and advanced algorithms for noise suppression and defect separation. This provides cost-effective, inline inspection control for critical levels. The 2835 is suitable for inline defect discovery and monitoring, hotspot discovery, engineering analysis, process window qualification, and photo cell monitoring.
    Documents

    No documents

    Similar Listings
    View All
    KLA 2835
    KLA
    2835
    Defect InspectionVintage: 0Condition: UsedLast Verified: Over 60 days ago