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KLA CANDELA 8620
    Description
    Wafer Size: 2 ~ 8 inch available (Currently 6" configured) Application S/W: 7.0 Build 11 OS Version: Windows XP professional SP3 Cassette Handling: Standard single puck with up to 200 mm cassette handler capability Illumination Source: Circumferential (50 mW, 405 nm), Radial (85 mW, 660 nm) Performance • Substrate Thickness: 380 ~ 1,300 µm • Defect Sensitivity: 0.08 µm (PSL on bare) Application Defect inspection of both opaque substrates such as Si, GaAs, and InP, as well as transparent materials such as SiC, GaN, sapphire, and glass. Utility • Physical Dimension (WDH): 110 * 138 * 180 cm • Weight Instrument: 860 lb (391 kg) • Input Power: 115 V 12 A 50/60 Hz • CDA: 95 ~ 110 PSI
    Configuration
    No Configuration
    OEM Model Description
    The Candela 8620 is an automated defect inspection system for LED substrates and epitaxy wafers. It provides enhanced quality control for materials such as gallium nitride, sapphire, and silicon carbide. Its proprietary optical design and detection technology can detect sub-micron defects that are not consistently identified by current inspection methods. This enables a production line monitor for yield-limiting defects, improving MOCVD reactor uptime and yield. The system can detect defects such as micro-scratches, micro-cracks, missing bumps, resist voids, hexagonal pits, and epi cracks, which can impact device performance, yield, and reliability.
    Documents
    verified-listing-icon

    Verified

    CATEGORY
    Defect Inspection

    Last Verified: Today

    Key Item Details

    Condition:

    Refurbished


    Operational Status:

    Unknown


    Product ID:

    138243


    Wafer Sizes:

    2"/50mm, 3"/75mm, 4"/100mm, 5"/125mm, 6"/150mm


    Vintage:

    2012


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
    View All
    KLA CANDELA 8620

    KLA

    CANDELA 8620

    Defect Inspection
    Vintage: 2012Condition: Used
    Last VerifiedOver 60 days ago

    KLA

    CANDELA 8620

    verified-listing-icon
    Verified
    CATEGORY
    Defect Inspection
    Last Verified: Today
    listing-photo-6190e42406c04c9eacad68c5b3df0467-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/53066/6190e42406c04c9eacad68c5b3df0467/de28069c650540a59e1c9780d8e38802_2_mw.png
    listing-photo-6190e42406c04c9eacad68c5b3df0467-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/53066/6190e42406c04c9eacad68c5b3df0467/a255319f120d4147b620b6ccfe4fb00f_1_mw.png
    Key Item Details

    Condition:

    Refurbished


    Operational Status:

    Unknown


    Product ID:

    138243


    Wafer Sizes:

    2"/50mm, 3"/75mm, 4"/100mm, 5"/125mm, 6"/150mm


    Vintage:

    2012


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    Wafer Size: 2 ~ 8 inch available (Currently 6" configured) Application S/W: 7.0 Build 11 OS Version: Windows XP professional SP3 Cassette Handling: Standard single puck with up to 200 mm cassette handler capability Illumination Source: Circumferential (50 mW, 405 nm), Radial (85 mW, 660 nm) Performance • Substrate Thickness: 380 ~ 1,300 µm • Defect Sensitivity: 0.08 µm (PSL on bare) Application Defect inspection of both opaque substrates such as Si, GaAs, and InP, as well as transparent materials such as SiC, GaN, sapphire, and glass. Utility • Physical Dimension (WDH): 110 * 138 * 180 cm • Weight Instrument: 860 lb (391 kg) • Input Power: 115 V 12 A 50/60 Hz • CDA: 95 ~ 110 PSI
    Configuration
    No Configuration
    OEM Model Description
    The Candela 8620 is an automated defect inspection system for LED substrates and epitaxy wafers. It provides enhanced quality control for materials such as gallium nitride, sapphire, and silicon carbide. Its proprietary optical design and detection technology can detect sub-micron defects that are not consistently identified by current inspection methods. This enables a production line monitor for yield-limiting defects, improving MOCVD reactor uptime and yield. The system can detect defects such as micro-scratches, micro-cracks, missing bumps, resist voids, hexagonal pits, and epi cracks, which can impact device performance, yield, and reliability.
    Documents
    Similar Listings
    View All
    KLA CANDELA 8620

    KLA

    CANDELA 8620

    Defect InspectionVintage: 2012Condition: UsedLast Verified:Over 60 days ago
    KLA CANDELA 8620

    KLA

    CANDELA 8620

    Defect InspectionVintage: 2011Condition: UsedLast Verified:Over 60 days ago
    KLA CANDELA 8620

    KLA

    CANDELA 8620

    Defect InspectionVintage: 2011Condition: RefurbishedLast Verified:Over 60 days ago