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KLA 2367
  • KLA 2367
  • KLA 2367
  • KLA 2367
Description
No description
Configuration
No Configuration
OEM Model Description
The 2367 UV/visible brightfield inspector is sensitive to a broad range of defects for 65nm and above design nodes. It has improved throughput, high defect sampling, and is field-upgradeable from any 23xx systems. It has a 2x data rate increase, low false count rate, and automatic defect classification algorithms. It can be used with 28xx inspection systems and other KLA-Tencor tools. It also has a Process Window Qualification application for detecting systematic defects.
Documents

No documents

verified-listing-icon

Verified

CATEGORY
Defect Inspection

Last Verified: Over 60 days ago

Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

23599


Wafer Sizes:

Unknown


Vintage:

2007


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

KLA

2367

verified-listing-icon
Verified
CATEGORY
Defect Inspection
Last Verified: Over 60 days ago
listing-photo-zisorRXu8EAUQ0qATbrr4laARBm69rCgWGWuNVSG698-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

23599


Wafer Sizes:

Unknown


Vintage:

2007


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No description
Configuration
No Configuration
OEM Model Description
The 2367 UV/visible brightfield inspector is sensitive to a broad range of defects for 65nm and above design nodes. It has improved throughput, high defect sampling, and is field-upgradeable from any 23xx systems. It has a 2x data rate increase, low false count rate, and automatic defect classification algorithms. It can be used with 28xx inspection systems and other KLA-Tencor tools. It also has a Process Window Qualification application for detecting systematic defects.
Documents

No documents