Description
-Main System Active damping subsystem (1) -Handler System E-chuck wafer holder & controller (1) -Factory Interface FOUP (2) -Handler System Pre Aligner (1)Configuration
E84, SECS/GEM, GEM300: CIM Software Version: 5.4.500OEM Model Description
The SEMVISION G5 is part of the Applied SEMVision™ family, which is the industry’s fastest and most sensitive line of defect review and analysis tools for 65/45nm manufacturing and beyond. The new line of three systems sets the industry benchmark with 30nm sensitivity and throughputs of up to 2,400 defects per hour. Used in an optimized defect review strategy, these systems can accelerate customers’ production ramp by rapidly identifying the root cause of systematic and yield-limiting defects.Documents
No documents
CATEGORY
Defect Inspection
Last Verified: 18 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
150394
Wafer Sizes:
12"/300mm
Vintage:
2012
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
SEMVISION G5 HP
CATEGORY
Defect Inspection
Last Verified: 18 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
150394
Wafer Sizes:
12"/300mm
Vintage:
2012
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
-Main System Active damping subsystem (1) -Handler System E-chuck wafer holder & controller (1) -Factory Interface FOUP (2) -Handler System Pre Aligner (1)Configuration
E84, SECS/GEM, GEM300: CIM Software Version: 5.4.500OEM Model Description
The SEMVISION G5 is part of the Applied SEMVision™ family, which is the industry’s fastest and most sensitive line of defect review and analysis tools for 65/45nm manufacturing and beyond. The new line of three systems sets the industry benchmark with 30nm sensitivity and throughputs of up to 2,400 defects per hour. Used in an optimized defect review strategy, these systems can accelerate customers’ production ramp by rapidly identifying the root cause of systematic and yield-limiting defects.Documents
No documents