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APPLIED MATERIALS (AMAT) P5000 CVD
    Description
    No description
    Configuration
    2 MARK II Oxide
    OEM Model Description
    The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.
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    verified-listing-icon

    Verified

    CATEGORY
    CVD

    Last Verified: Over 60 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    117062


    Wafer Sizes:

    8"/200mm


    Vintage:

    Unknown


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
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    APPLIED MATERIALS (AMAT) P5000 CVD

    APPLIED MATERIALS (AMAT)

    P5000 CVD

    CVD
    Vintage: 1995Condition: Used
    Last Verified24 days ago

    APPLIED MATERIALS (AMAT)

    P5000 CVD

    verified-listing-icon
    Verified
    CATEGORY
    CVD
    Last Verified: Over 60 days ago
    listing-photo-2e292cdb72d840169686b4db4a4c5a43-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    117062


    Wafer Sizes:

    8"/200mm


    Vintage:

    Unknown


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    2 MARK II Oxide
    OEM Model Description
    The Applied Materials Precision 5000 CVD is a single system solution for depositing high-quality, low-temperature dielectric materials on semiconductor devices. It incorporates multi-step processes to provide enabling technology for void-free intermetal dielectric deposition with profile control. The system’s process flexibility over a wide range of applications reduces the number and types of machines required for CVD. This makes it an efficient and cost-effective solution for semiconductor manufacturing.
    Documents

    No documents

    Similar Listings
    View All
    APPLIED MATERIALS (AMAT) P5000 CVD

    APPLIED MATERIALS (AMAT)

    P5000 CVD

    CVDVintage: 1995Condition: UsedLast Verified:24 days ago
    APPLIED MATERIALS (AMAT) P5000 CVD

    APPLIED MATERIALS (AMAT)

    P5000 CVD

    CVDVintage: 0Condition: UsedLast Verified:Over 60 days ago
    APPLIED MATERIALS (AMAT) P5000 CVD

    APPLIED MATERIALS (AMAT)

    P5000 CVD

    CVDVintage: 1990Condition: UsedLast Verified:Over 60 days ago