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Description
APCVD Atmospheric Pressure Chemical Vapor DepositionConfiguration
No ConfigurationOEM Model Description
The AMS 2100, a self-contained CVD system for volume production ofSiO 2 , PSG or BPSG films. Continuous processing provides high throughput rates; the optimum deposition rate of 1,100 A/minute provides low-stress films with guaranteed uniformities.Documents
No documents
Verified
CATEGORY
CVD
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
115776
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
AMS 2100
CATEGORY
CVD
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
115776
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
APCVD Atmospheric Pressure Chemical Vapor DepositionConfiguration
No ConfigurationOEM Model Description
The AMS 2100, a self-contained CVD system for volume production ofSiO 2 , PSG or BPSG films. Continuous processing provides high throughput rates; the optimum deposition rate of 1,100 A/minute provides low-stress films with guaranteed uniformities.Documents
No documents