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6" Fab For Sale from Moov - Click Here to Learn More
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6" Fab For Sale from Moov - Click Here to Learn More
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APPLIED MATERIALS (AMAT) AMS 2100
    Description
    APCVD Atmospheric Pressure Chemical Vapor Deposition
    Configuration
    No Configuration
    OEM Model Description
    The AMS 2100, a self-contained CVD system for volume production ofSiO 2 , PSG or BPSG films. Continuous processing provides high throughput rates; the optimum deposition rate of 1,100 A/minute provides low-stress films with guaranteed uniformities.
    Documents

    No documents

    APPLIED MATERIALS (AMAT)

    AMS 2100

    verified-listing-icon

    Verified

    CATEGORY
    CVD

    Last Verified: 27 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    115776


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
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    APPLIED MATERIALS (AMAT) AMS 2100

    APPLIED MATERIALS (AMAT)

    AMS 2100

    CVD
    Vintage: 0Condition: Used
    Last Verified27 days ago

    APPLIED MATERIALS (AMAT)

    AMS 2100

    verified-listing-icon
    Verified
    CATEGORY
    CVD
    Last Verified: 27 days ago
    listing-photo-43fb9114dc914281b361d20ee6cda0e7-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    115776


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    APCVD Atmospheric Pressure Chemical Vapor Deposition
    Configuration
    No Configuration
    OEM Model Description
    The AMS 2100, a self-contained CVD system for volume production ofSiO 2 , PSG or BPSG films. Continuous processing provides high throughput rates; the optimum deposition rate of 1,100 A/minute provides low-stress films with guaranteed uniformities.
    Documents

    No documents

    Similar Listings
    View All
    APPLIED MATERIALS (AMAT) AMS 2100

    APPLIED MATERIALS (AMAT)

    AMS 2100

    CVDVintage: 0Condition: UsedLast Verified:27 days ago