Description
APCVD Atmospheric Pressure Chemical Vapor DepositionConfiguration
No ConfigurationOEM Model Description
The AMS 2100, a self-contained CVD system for volume production ofSiO 2 , PSG or BPSG films. Continuous processing provides high throughput rates; the optimum deposition rate of 1,100 A/minute provides low-stress films with guaranteed uniformities.Documents
No documents
Verified
CATEGORY
CVD
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
115776
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
AMS 2100
CATEGORY
CVD
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
115776
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
APCVD Atmospheric Pressure Chemical Vapor DepositionConfiguration
No ConfigurationOEM Model Description
The AMS 2100, a self-contained CVD system for volume production ofSiO 2 , PSG or BPSG films. Continuous processing provides high throughput rates; the optimum deposition rate of 1,100 A/minute provides low-stress films with guaranteed uniformities.Documents
No documents