Description
DEVELOPERConfiguration
No ConfigurationOEM Model Description
The CLEAN TRACK™ ACT™ M incorporates three separate high-performance application modules: photomask developer, resist coater, and PEB (Post-Exposure Bake) oven. The system provides sophisticated process control and techniques in the photomask manufacturing process to meet the advanced requirements from industry for OPC(Optical Proximity Correction), phase shifting, and the use of chemical amplification resists. The system extends TEL's long-standing semiconductor and FPD coating and developing technology, and achieves high reliability by adopting CLEAN TRACK™ ACT™ technology.Documents
No documents
Verified
CATEGORY
Coaters & Developers
Last Verified: 2 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
139945
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
TEL / TOKYO ELECTRON
ACT M
CATEGORY
Coaters & Developers
Last Verified: 2 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
139945
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
DEVELOPERConfiguration
No ConfigurationOEM Model Description
The CLEAN TRACK™ ACT™ M incorporates three separate high-performance application modules: photomask developer, resist coater, and PEB (Post-Exposure Bake) oven. The system provides sophisticated process control and techniques in the photomask manufacturing process to meet the advanced requirements from industry for OPC(Optical Proximity Correction), phase shifting, and the use of chemical amplification resists. The system extends TEL's long-standing semiconductor and FPD coating and developing technology, and achieves high reliability by adopting CLEAN TRACK™ ACT™ technology.Documents
No documents