Description
PHOTO MARK_2 DV14(S-77)Configuration
No ConfigurationOEM Model Description
The CLEAN TRACK™ Mark-II is a coater/developer system developed by TEL. It is an advanced version of the first domestic model, the CLEAN TRACK™ Mark, which was based on a photoresist system developed and manufactured in the US. The Mark-II was able to transition to larger wafer sizes of up to 6 inches and featured an advanced controller. Through multiple efforts, such as introducing in-line models with exposure tools, the system’s productivity was continuously improved.Documents
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TEL / TOKYO ELECTRON
MARK II
Verified
CATEGORY
Coaters & Developers
Last Verified: 25 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
117324
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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TEL / TOKYO ELECTRON
MARK II
CATEGORY
Coaters & Developers
Last Verified: 25 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
117324
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
PHOTO MARK_2 DV14(S-77)Configuration
No ConfigurationOEM Model Description
The CLEAN TRACK™ Mark-II is a coater/developer system developed by TEL. It is an advanced version of the first domestic model, the CLEAN TRACK™ Mark, which was based on a photoresist system developed and manufactured in the US. The Mark-II was able to transition to larger wafer sizes of up to 6 inches and featured an advanced controller. Through multiple efforts, such as introducing in-line models with exposure tools, the system’s productivity was continuously improved.Documents
No documents