Description
COT/DEVConfiguration
L->R, 4FOUP, 9C6D, CGHP6, CPHP6, CGHA12, CEHP6, AC Power Rack, Chemical Box, TCU, T&HOEM Model Description
The CLEAN TRACK™ LITHIUS Pro™/LITHIUS Pro™ ｰi is a 300mm process coater/developer that offers enhanced productivity and a significantly decreased footprint. It supports advanced immersion lithography through innovative modules and integrated metrology for advanced process control solutions. This platform improves upon the core track concepts of OEE (Overall Equipment Efficiency) and lower CoO (Cost of Ownership). In summary, the CLEAN TRACK™ LITHIUS Pro™/LITHIUS Pro™ ｰi is a highly efficient and cost-effective solution for advanced immersion lithography.Documents
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TEL / TOKYO ELECTRON
LITHIUS Pro-i
Verified
CATEGORY
Coaters & Developers
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
95576
Wafer Sizes:
12"/300mm
Vintage:
2010
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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TEL / TOKYO ELECTRON
LITHIUS Pro-i
CATEGORY
Coaters & Developers
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
95576
Wafer Sizes:
12"/300mm
Vintage:
2010
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
COT/DEVConfiguration
L->R, 4FOUP, 9C6D, CGHP6, CPHP6, CGHA12, CEHP6, AC Power Rack, Chemical Box, TCU, T&HOEM Model Description
The CLEAN TRACK™ LITHIUS Pro™/LITHIUS Pro™ ｰi is a 300mm process coater/developer that offers enhanced productivity and a significantly decreased footprint. It supports advanced immersion lithography through innovative modules and integrated metrology for advanced process control solutions. This platform improves upon the core track concepts of OEE (Overall Equipment Efficiency) and lower CoO (Cost of Ownership). In summary, the CLEAN TRACK™ LITHIUS Pro™/LITHIUS Pro™ ｰi is a highly efficient and cost-effective solution for advanced immersion lithography.Documents
No documents