Description
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(5C/ 5D) (for Nikon S609B Immersion Scanner)OEM Model Description
The CLEAN TRACK LITHIUS i+ is a 300-mm/200-mm coater/developer designed for technology nodes 45-nm and beyond. It was developed based on three concepts: improved processing, short cycle times, and enhanced network solutions. The system achieves increased responsiveness and stability for important process technologies, shorter lead and start-up times, and allows for easier modifications. It is designed with a metrology integration block and offers an increased network capability that integrates various advanced network technologies, such as eDiagnostics and APC. The CLEAN TRACK LITHIUS i+ supports a throughput of 150 WPH (wafer per hour) and features a thermally isolated design that minimizes thermal interference. It comes standard with the core network solution “Ingenio,” a data analysis platform, and allows for full system integration of measurement and inspection tools. The CLEAN TRACK LITHIUS i+ is specifically developed for immersion technology and is suitable for lithography processes such as ArF immersion, ArF, KrF, and i-line.Documents
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TEL / TOKYO ELECTRON
LITHIUS i+
Verified
CATEGORY
Coaters & Developers
Last Verified: 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
116880
Wafer Sizes:
12"/300mm
Vintage:
2006
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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TEL / TOKYO ELECTRON
LITHIUS i+
CATEGORY
Coaters & Developers
Last Verified: 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
116880
Wafer Sizes:
12"/300mm
Vintage:
2006
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
(5C/ 5D) (for Nikon S609B Immersion Scanner)OEM Model Description
The CLEAN TRACK LITHIUS i+ is a 300-mm/200-mm coater/developer designed for technology nodes 45-nm and beyond. It was developed based on three concepts: improved processing, short cycle times, and enhanced network solutions. The system achieves increased responsiveness and stability for important process technologies, shorter lead and start-up times, and allows for easier modifications. It is designed with a metrology integration block and offers an increased network capability that integrates various advanced network technologies, such as eDiagnostics and APC. The CLEAN TRACK LITHIUS i+ supports a throughput of 150 WPH (wafer per hour) and features a thermally isolated design that minimizes thermal interference. It comes standard with the core network solution “Ingenio,” a data analysis platform, and allows for full system integration of measurement and inspection tools. The CLEAN TRACK LITHIUS i+ is specifically developed for immersion technology and is suitable for lithography processes such as ArF immersion, ArF, KrF, and i-line.Documents
No documents