Description
3 Develop, 2 coat cups, WEE, 3 Chill plates, 3 Chill/hot plates, 6 Precision chill/hot plates, 2 adhesion units, 2 cup washer Right, 2C, 2+?D, 2AD, 1PHP, 4HHP, 2LHP, 3CHP, 5PCH, 4CPL, 2CWH, 2TRS Mainframe : Dual Block LD: no modificationConfiguration
3 Develop, 2 coat cups, WEE, 3 Chill plates, 3 Chill/hot plates, 6 Precision chill/hot plates, 2 adhesion units, 2 cup washer Right, 2C, 2+?D, 2AD, 1PHP, 4HHP, 2LHP, 3CHP, 5PCH, 4CPL, 2CWH, 2TRS Mainframe : Dual Block LD: no modificationOEM Model Description
CLEAN TRACK™ ACT™ 8 is a state-of-the-art Coater/Developer designed for 75-200mm wafers. It offers stable, high-quality processing and enables a smooth transition from R&D to volume production. When used in-line with the exposure tool, the system has a similar footprint to its predecessors, but provides higher throughput due to its faster wafer transfer speed. The uptime has improved due to the increased reliability of components and ease of maintenance. The platform also uses a chemical filter and a high precision oven to support DUV processing. This makes it an ideal choice for those looking for a reliable and efficient Coater/Developer.Documents
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TEL / TOKYO ELECTRON
ACT 8
Verified
CATEGORY
Coaters & Developers
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
105267
Wafer Sizes:
8"/200mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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TEL / TOKYO ELECTRON
ACT 8
CATEGORY
Coaters & Developers
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
105267
Wafer Sizes:
8"/200mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
3 Develop, 2 coat cups, WEE, 3 Chill plates, 3 Chill/hot plates, 6 Precision chill/hot plates, 2 adhesion units, 2 cup washer Right, 2C, 2+?D, 2AD, 1PHP, 4HHP, 2LHP, 3CHP, 5PCH, 4CPL, 2CWH, 2TRS Mainframe : Dual Block LD: no modificationConfiguration
3 Develop, 2 coat cups, WEE, 3 Chill plates, 3 Chill/hot plates, 6 Precision chill/hot plates, 2 adhesion units, 2 cup washer Right, 2C, 2+?D, 2AD, 1PHP, 4HHP, 2LHP, 3CHP, 5PCH, 4CPL, 2CWH, 2TRS Mainframe : Dual Block LD: no modificationOEM Model Description
CLEAN TRACK™ ACT™ 8 is a state-of-the-art Coater/Developer designed for 75-200mm wafers. It offers stable, high-quality processing and enables a smooth transition from R&D to volume production. When used in-line with the exposure tool, the system has a similar footprint to its predecessors, but provides higher throughput due to its faster wafer transfer speed. The uptime has improved due to the increased reliability of components and ease of maintenance. The platform also uses a chemical filter and a high precision oven to support DUV processing. This makes it an ideal choice for those looking for a reliable and efficient Coater/Developer.Documents
No documents