Chemical Mechanical Polishing Machine
AMAT MIRRA 3400 CMP and OnTrak Clean provide chemical mechanical polishing and wafer cleaning for semiconductor manufacturing.

Applied Materials is committed to accelerating this new PPACt playbook for our customers and partners. We have the broadest and deepest portfolio of products for delivering PPACt innovations to the market. This portfolio encompasses the ability to create and deposit, shape and remove, modify, analyze, and connect materials and devices in new ways. We are unique in having a broad suite of process technology and metrology capabilities under one roof, and we have highly differentiated silicon and packaging lab capabilities. Our Integrated Materials Solutions co-optimize materials deposition, removal, modification, and analysis to create new materials and engineer new structures for high-performance, low-power chips at leading-edge nodes.

APPLIED MATERIALS (AMAT)

MIRRA 3400

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6" Fab For Sale from Moov - Click Here to Learn More

6" Fab For Sale from Moov - Click Here to Learn More

6" Fab For Sale from Moov - Click Here to Learn More

Description

Configuration

OEM Model Description

Documents

APPLIED MATERIALS (AMAT)

MIRRA 3400

CMP

Key Item Details

Similar Listings

APPLIED MATERIALS (AMAT)

MIRRA 3400

APPLIED MATERIALS (AMAT)

MIRRA 3400

APPLIED MATERIALS (AMAT)

MIRRA 3400

APPLIED MATERIALS (AMAT)

MIRRA 3400

APPLIED MATERIALS (AMAT)

MIRRA 3400

MIRRA 3400

CMP

Key Item Details

Description

Configuration

OEM Model Description

Documents

Similar Listings

APPLIED MATERIALS (AMAT)

MIRRA 3400

APPLIED MATERIALS (AMAT)

MIRRA 3400

APPLIED MATERIALS (AMAT)

MIRRA 3400

APPLIED MATERIALS (AMAT)

MIRRA 3400

APPLIED MATERIALS (AMAT)

MIRRA 3400