Description
CD SEMConfiguration
CD SEMOEM Model Description
The 8250 CD SEM Metrology system is a comprehensive solution for controlling critical dimensions in semiconductor device manufacturing. It offers real-time quality control during the etching process and correlation between the reticle and wafer dimensions. With direct device measurements, it allows for in-device CD control. The system improves edge capture for contacts and trenches, particularly at the bottom. The 8250 series is part of the 8200 CD SEM systems, which are used for lithography, etching, data storage, and reticle measurement applications. These systems provide superior image quality on reticles and charge-sensitive wafer layers, enabling automated metrology on poly layers, low-k dielectrics, and challenging substrates. When combined with SpectraCD, lithography data analysis, and advanced process control, the 8250 series forms a complete CD solution that enhances pattern transfer quality, bin yield, and device performance.Documents
No documents
KLA
8250
Verified
CATEGORY
CD-SEM
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
91285
Wafer Sizes:
8"/200mm
Vintage:
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Similar Listings
View AllKLA
8250
Verified
CATEGORY
CD-SEM
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
91285
Wafer Sizes:
8"/200mm
Vintage:
2000
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
CD SEMConfiguration
CD SEMOEM Model Description
The 8250 CD SEM Metrology system is a comprehensive solution for controlling critical dimensions in semiconductor device manufacturing. It offers real-time quality control during the etching process and correlation between the reticle and wafer dimensions. With direct device measurements, it allows for in-device CD control. The system improves edge capture for contacts and trenches, particularly at the bottom. The 8250 series is part of the 8200 CD SEM systems, which are used for lithography, etching, data storage, and reticle measurement applications. These systems provide superior image quality on reticles and charge-sensitive wafer layers, enabling automated metrology on poly layers, low-k dielectrics, and challenging substrates. When combined with SpectraCD, lithography data analysis, and advanced process control, the 8250 series forms a complete CD solution that enhances pattern transfer quality, bin yield, and device performance.Documents
No documents