Description
Electron microscopeConfiguration
FOUP Factory Interface ETU Handler Main System Process: CDSEM Software Version: 14.3.0 CIM: SECS/GEMOEM Model Description
Introduced in fiscal 2002, the NanoSEM 3D system extends CD-SEM technology beyond the measurement of critical dimensions to enable the three-dimensional imaging of chip features to more precisely control their lithography and etch processes.Documents
No documents
CATEGORY
CD-SEM
Last Verified: 5 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
154789
Wafer Sizes:
12"/300mm
Vintage:
2004
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
NANOSEM 3D
CATEGORY
CD-SEM
Last Verified: 5 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
154789
Wafer Sizes:
12"/300mm
Vintage:
2004
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Electron microscopeConfiguration
FOUP Factory Interface ETU Handler Main System Process: CDSEM Software Version: 14.3.0 CIM: SECS/GEMOEM Model Description
Introduced in fiscal 2002, the NanoSEM 3D system extends CD-SEM technology beyond the measurement of critical dimensions to enable the three-dimensional imaging of chip features to more precisely control their lithography and etch processes.Documents
No documents