Description
Matrix 105 CDConfiguration
No ConfigurationOEM Model Description
The Matrix System One Model 105 Asher is a single chamber, automatic microprocessor-controlled photoresist stripper that is set up for 4″ – 6″ wafers. It is configured for up to 6″ wafers and has independent control of pressure, RF power, temperature, gas flow, & substrate position. The Matrix 105 Asher has a 600W RF water-cooled generator and a multi-step program (three steps + over etch) process program. It also has a “Butterfly” Valve for more precise pressure control and a phase magnitude detector to provide real-time RF impedance matching control. The Matrix 105 Asher has two Mass Flow Controllers and a Vacuum Hose Assembly. The range for Strip is 150C to 250C +/-5C and the range for Descum is 70C to 150C +/-5C. It also has a Wafer Lift Pin Assembly (up and down).Documents
No documents
MATRIX
105
Verified
CATEGORY
Ashers / Plasma Cleaner
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
84631
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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MATRIX
105
CATEGORY
Ashers / Plasma Cleaner
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
84631
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Matrix 105 CDConfiguration
No ConfigurationOEM Model Description
The Matrix System One Model 105 Asher is a single chamber, automatic microprocessor-controlled photoresist stripper that is set up for 4″ – 6″ wafers. It is configured for up to 6″ wafers and has independent control of pressure, RF power, temperature, gas flow, & substrate position. The Matrix 105 Asher has a 600W RF water-cooled generator and a multi-step program (three steps + over etch) process program. It also has a “Butterfly” Valve for more precise pressure control and a phase magnitude detector to provide real-time RF impedance matching control. The Matrix 105 Asher has two Mass Flow Controllers and a Vacuum Hose Assembly. The range for Strip is 150C to 250C +/-5C and the range for Descum is 70C to 150C +/-5C. It also has a Wafer Lift Pin Assembly (up and down).Documents
No documents