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LAM RESEARCH / NOVELLUS / GASONICS L3510
  • LAM RESEARCH / NOVELLUS / GASONICS L3510
  • LAM RESEARCH / NOVELLUS / GASONICS L3510
  • LAM RESEARCH / NOVELLUS / GASONICS L3510
Description
No description
Configuration
SW Ver: 7.5 gem mw power 1.25kw Model: C12935 Gas 2 Gas O2. & N2 Robot: Brooks Zbot
OEM Model Description
PEP3510A is a dry chemistry downstream processing system for photoresist removal, manufactured by GaSonics. It incorporates the company’s proprietary microwave downstream processing technology and is designed for advanced IC manufacturers. The system can handle feature sizes of 0.25 microns and below, with throughput rates ranging from approximately 45 to 55 wafers per hour.
Documents

No documents

LAM RESEARCH / NOVELLUS / GASONICS

L3510

verified-listing-icon

Verified

CATEGORY
Ashers / Plasma Cleaner

Last Verified: Over 60 days ago

Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

98801


Wafer Sizes:

Unknown


Vintage:

Unknown


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

LAM RESEARCH / NOVELLUS / GASONICS

L3510

verified-listing-icon
Verified
CATEGORY
Ashers / Plasma Cleaner
Last Verified: Over 60 days ago
listing-photo-bf62104737fc4bad97d985597a7e1dd4-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

98801


Wafer Sizes:

Unknown


Vintage:

Unknown


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No description
Configuration
SW Ver: 7.5 gem mw power 1.25kw Model: C12935 Gas 2 Gas O2. & N2 Robot: Brooks Zbot
OEM Model Description
PEP3510A is a dry chemistry downstream processing system for photoresist removal, manufactured by GaSonics. It incorporates the company’s proprietary microwave downstream processing technology and is designed for advanced IC manufacturers. The system can handle feature sizes of 0.25 microns and below, with throughput rates ranging from approximately 45 to 55 wafers per hour.
Documents

No documents