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Description
GASONIC L3510 Single Wafer Downstream Photoresist AsherConfiguration
8” configured (can change to 6”) Quartz Plasma Tube and Baffles ASTEX Microwave 1.2kw Temperature Controlled Wafer Cooled Aluminum Process Chamber Robotic Pick and Place Wafer Handler ( KORO ) Fixed Position Single Cassette Station Downstream End Point Detection SEMI SECS ⅱ Software 2 Gas Mass Flow Controller : O2 4slpm , N2 2slpm System Power : 208 VAC , 60 A, 3 Phase, 50/60HzOEM Model Description
PEP3510A is a dry chemistry downstream processing system for photoresist removal, manufactured by GaSonics. It incorporates the company’s proprietary microwave downstream processing technology and is designed for advanced IC manufacturers. The system can handle feature sizes of 0.25 microns and below, with throughput rates ranging from approximately 45 to 55 wafers per hour.Documents
CATEGORY
Ashers / Plasma Cleaner
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
82160
Wafer Sizes:
8"/200mm
Vintage:
1996
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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LAM RESEARCH / NOVELLUS / GASONICS
L3510
CATEGORY
Ashers / Plasma Cleaner
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
82160
Wafer Sizes:
8"/200mm
Vintage:
1996
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available