
Description
Dimensions & weight estimates: Mainframe dim (cm): 85 x 110 x 155 Mainframe weight (kg): 200Configuration
"Gasonics L3510 - Asher 200mm convertible: Yes Robot upgrade: HINE Hatm 5.0 atmospheric robot arm Process Gasses: O2 and N2OEM Model Description
PEP3510A is a dry chemistry downstream processing system for photoresist removal, manufactured by GaSonics. It incorporates the company’s proprietary microwave downstream processing technology and is designed for advanced IC manufacturers. The system can handle feature sizes of 0.25 microns and below, with throughput rates ranging from approximately 45 to 55 wafers per hour.Documents
No documents
CATEGORY
Ashers / Plasma Cleaner
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
132528
Wafer Sizes:
6"/150mm
Vintage:
1995
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Similar Listings
View AllLAM RESEARCH / NOVELLUS / GASONICS
L3510
CATEGORY
Ashers / Plasma Cleaner
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
132528
Wafer Sizes:
6"/150mm
Vintage:
1995
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Dimensions & weight estimates: Mainframe dim (cm): 85 x 110 x 155 Mainframe weight (kg): 200Configuration
"Gasonics L3510 - Asher 200mm convertible: Yes Robot upgrade: HINE Hatm 5.0 atmospheric robot arm Process Gasses: O2 and N2OEM Model Description
PEP3510A is a dry chemistry downstream processing system for photoresist removal, manufactured by GaSonics. It incorporates the company’s proprietary microwave downstream processing technology and is designed for advanced IC manufacturers. The system can handle feature sizes of 0.25 microns and below, with throughput rates ranging from approximately 45 to 55 wafers per hour.Documents
No documents