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LAM RESEARCH / NOVELLUS / GASONICS PEP 3510A
    Description
    Photoresist stripping system
    Configuration
    Software version: 4.0 CIM: GEM Handler system: XU-RCM4700 (Yaskawa robot assy) Does not include: Dry pumps LPT
    OEM Model Description
    PEP3510A is a dry chemistry downstream processing system for photoresist removal, manufactured by GaSonics. It incorporates the company’s proprietary microwave downstream processing technology and is designed for advanced IC manufacturers. The system can handle feature sizes of 0.25 microns and below, with throughput rates ranging from approximately 45 to 55 wafers per hour.
    Documents

    No documents

    verified-listing-icon

    Verified

    CATEGORY
    Ashers / Plasma Cleaner

    Last Verified: 3 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    154189


    Wafer Sizes:

    Unknown


    Vintage:

    2006


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
    View All
    LAM RESEARCH / NOVELLUS / GASONICS PEP 3510A

    LAM RESEARCH / NOVELLUS / GASONICS

    PEP 3510A

    Ashers / Plasma Cleaner
    Vintage: 2006Condition: Used
    Last Verified3 days ago

    LAM RESEARCH / NOVELLUS / GASONICS

    PEP 3510A

    verified-listing-icon
    Verified
    CATEGORY
    Ashers / Plasma Cleaner
    Last Verified: 3 days ago
    listing-photo-57252be9745e4edcade1b0f8eb331b19-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/90238/57252be9745e4edcade1b0f8eb331b19/4697fb76647e4fe0a1e58a87fd7e4f4a_untitled4_mw.jpg
    listing-photo-57252be9745e4edcade1b0f8eb331b19-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/90238/57252be9745e4edcade1b0f8eb331b19/794f234c7ad94760b3a9dd06e1d62bb3_untitled2_mw.jpg
    listing-photo-57252be9745e4edcade1b0f8eb331b19-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/90238/57252be9745e4edcade1b0f8eb331b19/0d21fdf33c9f4191b873ad96205069bc_untitled_mw.jpg
    listing-photo-57252be9745e4edcade1b0f8eb331b19-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/90238/57252be9745e4edcade1b0f8eb331b19/b7c5555e42af40a7936af8c8e3950bc0_untitled3_mw.jpg
    listing-photo-57252be9745e4edcade1b0f8eb331b19-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/90238/57252be9745e4edcade1b0f8eb331b19/c240804e3d9b44ae8bda0614c582f938_untitled5_mw.jpg
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    154189


    Wafer Sizes:

    Unknown


    Vintage:

    2006


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    Photoresist stripping system
    Configuration
    Software version: 4.0 CIM: GEM Handler system: XU-RCM4700 (Yaskawa robot assy) Does not include: Dry pumps LPT
    OEM Model Description
    PEP3510A is a dry chemistry downstream processing system for photoresist removal, manufactured by GaSonics. It incorporates the company’s proprietary microwave downstream processing technology and is designed for advanced IC manufacturers. The system can handle feature sizes of 0.25 microns and below, with throughput rates ranging from approximately 45 to 55 wafers per hour.
    Documents

    No documents

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