Description
RESIST STRIPConfiguration
No ConfigurationOEM Model Description
PEP3510A is a dry chemistry downstream processing system for photoresist removal, manufactured by GaSonics. It incorporates the company’s proprietary microwave downstream processing technology and is designed for advanced IC manufacturers. The system can handle feature sizes of 0.25 microns and below, with throughput rates ranging from approximately 45 to 55 wafers per hour.Documents
No documents
CATEGORY
Ashers / Plasma Cleaner
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
127681
Wafer Sizes:
8"/200mm
Vintage:
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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LAM RESEARCH / NOVELLUS / GASONICS
PEP 3510A
CATEGORY
Ashers / Plasma Cleaner
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
127681
Wafer Sizes:
8"/200mm
Vintage:
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
RESIST STRIPConfiguration
No ConfigurationOEM Model Description
PEP3510A is a dry chemistry downstream processing system for photoresist removal, manufactured by GaSonics. It incorporates the company’s proprietary microwave downstream processing technology and is designed for advanced IC manufacturers. The system can handle feature sizes of 0.25 microns and below, with throughput rates ranging from approximately 45 to 55 wafers per hour.Documents
No documents