Delivers smart solutions that remove barriers to nanoscale devices and advanced packaging production.

VEECO / ULTRATECH / CAMBRIDGE

Nano 160 1500

NANOTECH 200i

The Fiji series is a next-generation Atomic Layer Deposition (ALD) system that offers a wide range of deposition modes. Its modular design and flexible architecture allow for multiple configurations of precursors and plasma gases, making it capable of performing both thermal and plasma-enhanced deposition. The system has dimensions of 1600 x 715 x 1920 mm (F200) or 1845 x 715 x 1920 mm with a load lock (F200 with load lock). With its advanced capabilities, the Fiji 2000 is an excellent choice for high-vacuum ALD applications.

FIJI 200

NANOTECH 200

The Company has introduced the NanoTech 190 steppers, with enhanced capabilities directed at TFH backend, or rowbar processing applications. These steppers are used to expose the Air Bearing Surface (ABS) patterns on rowbars and pole trimming.

NANOTECH 190

The NanoTech 160 system utilizes a platform based on the previous 1000 Series steppers, incorporating Dual Side Alignment (“DSA”) capability for applications requiring lithography on both sides of a wafer. The NanoTech 160 is an extension of the model 1600DSA stepper, and enhances the capabilities of the 1000 Series steppers by offering the first stepper with Dual Side Alignment capability, providing customers with a 1X stepper solution to this special processing requirement.

VEECO / ULTRATECH / CAMBRIDGE

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Nano 160 1500

NANOTECH 200i

FIJI 200

NANOTECH 200

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