RAITH

EBPG5000

The VOYAGER is a dedicated high-performance electron beam lithography system which is especially suitable wherever straightforward access to electron beam lithography in multi-user facilities is needed. The fully automated and ultra-ergonomic system with smart features and innovative system architecture ensures shortest time to result, making it suitable for both academic and industrial environments.

VOYAGER

The RAITH150 is a multipurpose tool that can perform direct e-beam exposure and wafer scale process development at suboptical resolution. It includes integrated linewidth and metrology functions that optimize process reproducibility. The SEM side can be used to obtain large high magnification tiled images by taking advantage of the high resolution interferometer stage.

150 E BEAM

ionLINE Plus

PICOMASTER

Ultra-high-performance electron beam lithography system

EBPG5200

With sub 20nm lithography, highest resolution imaging capabilities and very low cost of ownership, the PIONEER is the ideal choice if you are looking for an uncompromised and affordable solution for fabrication and inspection of nanostructures. The PIONEER is the first true EBL/SEM hybrid available!

PIONEER

Tailored for all direct-write applications, the EBPG5150 is specifically optimized for a 155 mm by 155 mm stage, utilizing the universal plinth platform shared with the EBPG5200. Its versatile design allows for loading different sample sizes and quantities, accommodating anything from individual piece parts to full wafer sizes with ease.

EBPG5150

The RAITH150 Two has established itself as a bestseller among universal high-resolution Electron Beam Lithography systems. It is utilized in research and nanotechnology centers worldwide and has proven its robustness in 24/7 use. The RAITH150 Two e-beam writer is designed to help with the transition from single-device-oriented research towards small-batch fabrication of nanodevices, thus bridging the gap between academic and industrial R&D with respect to its capilities in rapid prototyping of devices for industrial applications.

150 TWO

EBPG5000+ 

EBPG5150 PLUS

he Raith e-LiNE is an electron beam lithography tool which utilizes thermal field emission filament technology and a laser-interferometer controlled stage.  The system is equipped with a load lock, an automatic height laser sensor, and both In-lens and SE2 detectors.

e-LiNE

Precise and fast – Accelerate your SEM or FIB-SEM

ELPHY Plus pattern processor (DSP technology) has been designed with utmost care to deliver unexcelled electronic performance. This is an undeniable prerequisite for nanolithography with ultimate resolution, precision, and stability – specifically when attached to modern thermal-field emission based SEMs with high beam current densities.

RAITH

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EBPG5000

VOYAGER

150 E BEAM

ionLINE Plus

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