EBARA

A70W

A150W-T

A150W-M

A10S

150 X 40

A70WN	

AA40W

A30W

AA70W

The Ebara FREX 300 S is a 300mm CMP system, featuring a four-head, four-platen design with a three-step clean process. It reliably meets 7nm tech requirements, providing development and production flexibility, and best-in-class reliability and cost of ownership.

F-REX300S

This 300mm CPM system uses EBARA’s Dry-In/ Dry-Out processing and two-head/ two platen design for maximum operation flexibility. Features include 3-step cleaning, 4 FOUP loading ports, and buff stations.

F-REX300

AA20

AA200W

AAE40WN

40 X 20

AA200WN

Vacuum Dry Pump AA20N-H, 200V, 50/60 Hz, Corrosian Resist, Horizontal Outlet, with Exhaust Pressure Sensor

AA20N-H

80 X 25

AA20N

A300W	

EBARA FREX 200 is a CMP system which is used for wafer grinding, lapping, and polishing. The FREX 200 is compatible with 200mm wafer size.

F-REX200

150X40 UERP6M

AA30

AA10

EPO 112

EPO 223

ESA70W

ET600H-US

GDC 250 SA

AA40WN

AAS300WN

AA10N	

50 X 20

EAC300BI-T

305W

AAS200WN

EPO 222

AA100W

A30W-C

A25S

ESR20N

EBARA's CMP system Model F-REX is Chemical Mechanical Polishing system that enables nanometer level planarity (10~20nm on 300mm wafer) in semiconductor manufacturing process. Ebara's CMP system, Model F-REX200M2 and F-REX300X has achieved both an advanced
process performance and high productivity. This is made possible with "1-head per 1-table" unique architecture processing an individual wafer delicately while the "4 table platform" enables high throughput.

F-REX300X

GDS500SA	

Pumping Speed: 1670 L/min
Ultimate Pressure: 5.0Pa

EV-S20P

ET-300W	

Technical Characteristics:
-DC Motor
-Low Energy consumption
-Complete pump safeguard system
-High pump operating temperature preventing condensation
-Low noise and low vibration

AAL10

Vacuum Dry Pump AA20-H, 200V, 50/60 Hz, Horizontal Outlet

AA20-H

UFP 300A

AA70W-H

ET-600	

EPO 222T

A07V

AA70WN

EPO-222D

The F-REX300S2 and F-REX300X3SC offers a four head, four platen with three step clean design allowing for customized process recipes with the demonstrated capability to reliably meet 7nm technology requirements. 

F-REX300SII

AA70WN-H

150X40UERP6M-J

AA40WV1-H

EPO 2228

CS-22

Dry (oil free) vacuum pumps
Pumping Speed (60 Hz): 20,000 l/min

EST200WN

EMT2400MBWC	

50X20UERR6M

ET1600WS

UERR6M 50X20 

AAS100WN

ESR200WN

A30W N

Vacuum Dry Pump A07V-B, 200V, 50/60 Hz, Basic Version

A07V-B

150X40 UERP6M-U

GDS250SA

ESA25-D

ESDP 30	

Dry (oil free) vacuum pumps 
Pumping Speed (60 Hz): 30,000 l/min

EST300WN

EV-A03-1

EV-A10-2

AA10Nv1	

40×20 ERD5M-N

40X20ERD5M-NJ

AA70WV1-H

**PARTS**

AAS20N

AA40WNV1-E

Pumping Speed: 1670 L/min
Ultimate Pressure: 5.0 Pa

EV-S20N

EV-A06-3

40X20ERD5M

MS-96770-1T/011126401

A150W

GDC250A

AA10NV1-H

UFP-100/150A

AA10V1

EPO 213

ESR100-CN

AA100V1 H

The Model EV-M302N dry vacuum pumps are designed for high-load applications where large volumes of reaction byproducts are generated. Its outstanding power consumption performance and enhanced corrosion resistance, as a standard, support a broad range of industry applications.           

Options:
-Various Booster & Exhaust Thermal Configurations (Process Dependent)
-ESD Resistance
-Idle Mode (Green Energy Mode)
-Hardware: Seismic Brackets
-Pump Systems – Integrated Rack Solutions
-Pump Installation Lifts
-Reusable Shipping Crates

EBARA

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