EBARA

A150W-T

A150W-M

A10S

150 X 40

A70W

AA40W

A30W

AA70W

The Ebara FREX 300 S is a 300mm CMP system, featuring a four-head, four-platen design with a three-step clean process. It reliably meets 7nm tech requirements, providing development and production flexibility, and best-in-class reliability and cost of ownership.

F-REX300S

A70WN	

This 300mm CPM system uses EBARA’s Dry-In/ Dry-Out processing and two-head/ two platen design for maximum operation flexibility. Features include 3-step cleaning, 4 FOUP loading ports, and buff stations.

F-REX300

AAE40WN

AA200W

AA200WN

40 X 20

EPO 112

AA20

80 X 25

EAC300BI-T

EBARA FREX 200 is a CMP system which is used for wafer grinding, lapping, and polishing. The FREX 200 is compatible with 200mm wafer size.

F-REX200

AA10N	

A300W	

AA30

150X40 UERP6M

Vacuum Dry Pump AA20N-H, 200V, 50/60 Hz, Corrosian Resist, Horizontal Outlet, with Exhaust Pressure Sensor

AA20N-H

AA10

EPO 113

AA20N

GDC 250 SA

ESA70W

Dry (oil free) vacuum pumps
Pumping Speed (60 Hz): 20,000 l/min

EST200WN

ESR80WN

ET600H-US

GDS500SA	

AA40WN

EPO 2228

EPO 223

50 X 20

ET-600	

AA70W-H

305W

EPO 222

AA70WN

Pumping Speed: 1670 L/min
Ultimate Pressure: 5.0Pa

EV-S20P

EAC300bi-hv

Technical Characteristics:
-DC Motor
-Low Energy consumption
-Complete pump safeguard system
-High pump operating temperature preventing condensation
-Low noise and low vibration

AAL10

ESR20N

AA40WV1-H

AA100W

AAS300WN

ET-300W	

Vacuum Dry Pump AA20-H, 200V, 50/60 Hz, Horizontal Outlet

AA20-H

EBARA's CMP system Model F-REX is Chemical Mechanical Polishing system that enables nanometer level planarity (10~20nm on 300mm wafer) in semiconductor manufacturing process. Ebara's CMP system, Model F-REX200M2 and F-REX300X has achieved both an advanced
process performance and high productivity. This is made possible with "1-head per 1-table" unique architecture processing an individual wafer delicately while the "4 table platform" enables high throughput.

F-REX300X

GDS250SA

A25S

AAS200WN

The F-REX300S2 and F-REX300X3SC offers a four head, four platen with three step clean design allowing for customized process recipes with the demonstrated capability to reliably meet 7nm technology requirements. 

F-REX300SII

AAS100WN

AA70WN-H

Pumping speed (N2) l/min. 7000
Pumping speed (N2) m3/h 420
Ultimate pressure mbar 2x10-3
Ultimate pressure Pa 0.2
Water Consumption l/min 3.5-8
Nitrogen Consumption SLM 11-13
Nitrogen Consumption Pa m3/sec 19-22
Voltages ranges V 200-220/380-415
Motor power, installed kW 7.5
Weight, approx. kg 280
Sizes (LxWxH) mm 830x400x800
Inlet flange size DN 50 KF
Outlet flange size DN 40 KF

AAS70WN

ESR100WN

Pumping Speed: 1670 L/min
Ultimate Pressure: 5.0 Pa

EV-S20N

ESR200WN

Vacuum Dry Pump A07V-B, 200V, 50/60 Hz, Basic Version

A07V-B

A150W

EST100WN

ESA25-D

Dry (oil free) vacuum pumps 
Pumping Speed (60 Hz): 30,000 l/min

EST300WN

A07V

A30W N

EST100WNHT	

EPO 222A

50X20UERR6M

ESDP 30	

EPO-222D

EMT2400MBWC	

Dry (oil free) vacuum pumps
Pumping Speed (60 Hz): 30,000 l/min

EST500WN

CS-22

UFP 200/300A

150X40 UERP6M-U

150X40UERP6M-J

GDC250A

EPO 222T

UERR6M 50X20 

ESR201W

ET1600WS

UFP 300A

AA10Nv1	

EV-A03-1

A40W

EV-A10-2

A500W-T	

AA10V1

AA10NV1-H

ESR100-CN

EPO-2226D

EV-S20

EPOS-010

A30W-C

JSM-6320

6" Fab For Sale from Moov - Click Here to Learn More

6" Fab For Sale from Moov - Click Here to Learn More

6" Fab For Sale from Moov - Click Here to Learn More

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150 X 40

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