AVIZA / WATKINS-JOHNSON

**PARTS**

The Watkins Johnson (WJ) WJ-999R is an advanced and versatile system designed for chemical vapor deposition (APCVD) applications in semiconductor production lines using 100mm to 150mm wafers. It has the capability to process two wafers simultaneously in parallel, optimizing throughput. The system offers the flexibility to handle both doped and un-doped silicon dioxide processing, making it suitable for a wide range of semiconductor manufacturing requirements. 

WJ-999R

The WJ-999 is a product from Watkins Johnson. It is an Atmospheric Pressure CVD with 3 process chambers for TEOS and hydride processes. It is used for depositing doped or undoped silicon dioxide (SiO2) films, created from either the TEOS/Ozone or Silane/Oxygen CVD reaction.

WJ-999

The Watkins Johnson (WJ) WJ-1000 is an advanced chemical vapor deposition (APCVD) system specifically designed for high productivity in 200mm wafer processing lines. It offers two processing options: hybrid or TEOS-reactant processes. The system is capable of both doped and un-doped deposition of TEOS-based silicon dioxide, providing excellent flexibility for a wide range of dielectric film applications in various semiconductor manufacturing processes. 

WJ-1000

WJ-1000T

The WJ-1000H Hydride system deposits doped or undoped silicon dioxide (SiO2) films, created from the Silane/Oxygen CVD reaction. It is capable of processing 100-mm to 200-mm wafers and has demonstrated high productivity and reliability. The system is designed for process flexibility and produces consistent film properties over the entire wafer surface. It has a low cost of ownership due to its MonoBlok™ Linear injector and high throughput.

WJ 1000H

WJ 1500 APCVD system processes 200mm wafers addressing design-rule fabrication capability of 0.15 micron. It offers relatively low cost of ownership with a process designed to result in improved reliability, performance and serviceability through enhanced film uniformity, reduced consumables, improved system availability and ultra-low film metal levels. Our 1500 APCVD system provides both doped and un-doped deposition of tetraethylorthosilicate- , or TEOS- , based silicon dioxide and can be utilized in a broad range of dielectric film applications for both logic and memory manufacturing requirements.

AVIZA / WATKINS-JOHNSON

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WJ-999R

WJ-999

WJ-1000

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