Description
Dry etch systemConfiguration
Known issues: Not included: (Qty 2) LPT Dry Pump VHP Robot Handler Process: METAL ETCHER Software Version: E4.7_25OEM Model Description
In September 1992, AMAT announced the Centura Poly, a single-wafer, multichamber platform targeted at the high-temperature thin film deposition of polysilicon on wafers up to 200mm (8 inch) in diameter.Documents
No documents
CATEGORY
ALD
Last Verified: 6 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
154782
Wafer Sizes:
8"/200mm
Vintage:
2001
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
APPLIED MATERIALS (AMAT)
CENTURA POLY
CATEGORY
ALD
Last Verified: 6 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
154782
Wafer Sizes:
8"/200mm
Vintage:
2001
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Dry etch systemConfiguration
Known issues: Not included: (Qty 2) LPT Dry Pump VHP Robot Handler Process: METAL ETCHER Software Version: E4.7_25OEM Model Description
In September 1992, AMAT announced the Centura Poly, a single-wafer, multichamber platform targeted at the high-temperature thin film deposition of polysilicon on wafers up to 200mm (8 inch) in diameter.Documents
No documents