TWINSCAN NXT:1980Di
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193 nm Step and ScanOverview
The TWINSCAN NXT:1980Di delivers high productivity and reliability for volume production at advanced nodes with a global system uptime of >97%. Like the TWINSCAN NXT:2000i, this step-and-scan system is a high-productivity, dual-stage immersion lithography tool designed for volume production of 300 mm wafers at advanced nodes.
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