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Röntgendiffraktometer zur Messung hochauflösender Röntgenbeugung und Röntgenreflektion mit CU-KA Anode für 6" und 8" Wafer X-Ray Diffractometer for measuring high resolution X-ray Diffraction and Reflection applications with a Cu-kA Anode for 6 and 8 inch wafers Still in production. Ready for inspection.OEM Model Description
The D8 FABLINE provides fully automated handling of 300mm wafers . It provides a wide spectrum of techniques, such as rapid X-ray reflectivity (XRR), grazing incidence X-ray diffraction (GID), and high-resolution X-ray diffraction (HR-XRD) in order to facilitate advanced process development and control on strained devices and high-K thin films, as well as materials characterization for future generation technology nodes.Documents
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BRUKER
D8 FABLINE
Verified
CATEGORY
X-Ray
Key Item Details
Condition:
Unknown
Operational Status:
Unknown
Product ID:
16327
Wafer Sizes:
8"/200mm
Vintage:
2011
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Logistics Support
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Transaction Insured by Moov
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Refurbishment Services
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BRUKER
D8 FABLINE
Verified
CATEGORY
X-Ray
Last Verified: Over 60 days ago
Key Item Details
Condition:
Unknown
Operational Status:
Unknown
Product ID:
16327
Wafer Sizes:
8"/200mm
Vintage:
2011
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
Röntgendiffraktometer zur Messung hochauflösender Röntgenbeugung und Röntgenreflektion mit CU-KA Anode für 6" und 8" Wafer X-Ray Diffractometer for measuring high resolution X-ray Diffraction and Reflection applications with a Cu-kA Anode for 6 and 8 inch wafers Still in production. Ready for inspection.OEM Model Description
The D8 FABLINE provides fully automated handling of 300mm wafers . It provides a wide spectrum of techniques, such as rapid X-ray reflectivity (XRR), grazing incidence X-ray diffraction (GID), and high-resolution X-ray diffraction (HR-XRD) in order to facilitate advanced process development and control on strained devices and high-K thin films, as well as materials characterization for future generation technology nodes.Documents
No documents