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Description
No descriptionConfiguration
No ConfigurationOEM Model Description
Archer AIM is an Advanced Optical Overlay Metrology product that improves stepper correction accuracy, provides precise data, and enables design rule segmentation. It delivers industry-leading precision performance, reduces total measurement uncertainty, and increases sampling rate. It also includes offline automatic recipe creation and real-time analysis software. The MPX option enables ‘on product’ monitoring of focus-exposure. Archer AIM targets new standards for lithography process control for 65-nm and beyond, reducing measurement uncertainty and enabling control of overlay error budgets. It integrates with KLA-Tencor’s software management products to provide comprehensive optical overlay metrology process control.Documents
No documents
Verified
CATEGORY
Overlay
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
49242
Wafer Sizes:
8"/200mm
Vintage:
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
KLA
ARCHER AIM
CATEGORY
Overlay
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
49242
Wafer Sizes:
8"/200mm
Vintage:
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
No ConfigurationOEM Model Description
Archer AIM is an Advanced Optical Overlay Metrology product that improves stepper correction accuracy, provides precise data, and enables design rule segmentation. It delivers industry-leading precision performance, reduces total measurement uncertainty, and increases sampling rate. It also includes offline automatic recipe creation and real-time analysis software. The MPX option enables ‘on product’ monitoring of focus-exposure. Archer AIM targets new standards for lithography process control for 65-nm and beyond, reducing measurement uncertainty and enabling control of overlay error budgets. It integrates with KLA-Tencor’s software management products to provide comprehensive optical overlay metrology process control.Documents
No documents