Description

No description

Configuration

Process: Nitride Etch CHCL CHF(BOE) EDR H3PO4 H3PO4 H/C QDR SC-1 QDR LPD

OEM Model Description

The WS-820L Wet Station is a cassetteless wafer cleaning system for 8-inch wafers. It can be custom-configured to meet your precise needs simply by combining compactly designed interface, processing, drying and transfer modules. The WS-820L is further distinguished by its high-tolerance processing, stability, and ease of operation and maintenance. It sets new benchmarks for productivity and advances the overall rationalization of the wafer rinsing process.