
Description
No descriptionConfiguration
Process: Wet Chemistry Etching 1 Basins HCl acid (T ≤ 100°C) 1 QDR basins / “DIS Dryer” 2/3 I/O Carrier ports 3 Loadports IN + 3 Loadports OUT. Total 6. Automatic robot handlingOEM Model Description
High Throughput Batch Cleaning Systems Enable Flexible Line Configurations: WS-820C is for 200 mm wafers with carrier transfer processing.Documents
No documents
CATEGORY
Wet Benches - Auto
Last Verified: 5 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
137931
Wafer Sizes:
Unknown
Vintage:
2019
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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WS-820C
CATEGORY
Wet Benches - Auto
Last Verified: 5 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
137931
Wafer Sizes:
Unknown
Vintage:
2019
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
Process: Wet Chemistry Etching 1 Basins HCl acid (T ≤ 100°C) 1 QDR basins / “DIS Dryer” 2/3 I/O Carrier ports 3 Loadports IN + 3 Loadports OUT. Total 6. Automatic robot handlingOEM Model Description
High Throughput Batch Cleaning Systems Enable Flexible Line Configurations: WS-820C is for 200 mm wafers with carrier transfer processing.Documents
No documents