
Description
Purpose: Vapor MEMS Release -Use for silicon sacrificial layer removal (Etching) -Single wafer process in vacuum chamber -Process Temperature can be 5oC to >100oCConfiguration
Chemicals: HF Process type: Single wafer Pumping system: -Ebara AA200WN*2 -Ebara AA40WN*2 (1 for service and 1 for spare) Local Scrubber: Kanken Techno KW300OEM Model Description
None ProvidedDocuments
No documents
Verified
CATEGORY
Wafer Handling
Last Verified: 2 days ago
Key Item Details
Condition:
New
Operational Status:
Unknown
Product ID:
147939
Wafer Sizes:
Unknown
Vintage:
2021
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
memsstar
Orbis 3000
CATEGORY
Wafer Handling
Last Verified: 2 days ago
Key Item Details
Condition:
New
Operational Status:
Unknown
Product ID:
147939
Wafer Sizes:
Unknown
Vintage:
2021
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Purpose: Vapor MEMS Release -Use for silicon sacrificial layer removal (Etching) -Single wafer process in vacuum chamber -Process Temperature can be 5oC to >100oCConfiguration
Chemicals: HF Process type: Single wafer Pumping system: -Ebara AA200WN*2 -Ebara AA40WN*2 (1 for service and 1 for spare) Local Scrubber: Kanken Techno KW300OEM Model Description
None ProvidedDocuments
No documents