Description
Critical dimensions No missing parts Current Wafer size : 12Configuration
No ConfigurationOEM Model Description
In February 2006, KLA introduced the SpectraCD-XT—our fourth-generation of inline optical CD metrology systems for advanced patterning process control at the 90nm and 65nm nodes. SpectraCD-XT is a non-destructive dedicated CD and profile metrology system built on our high-throughput, production-proven Archer platform. The tool is the only high performance spectroscopic ellipsometry (SE)-basedDocuments
No documents
KLA
SpectraCD-XT
Verified
CATEGORY
Thin Film / Film Thickness
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Deinstalled
Product ID:
107077
Wafer Sizes:
8"/200mm, 12"/300mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
KLA
SpectraCD-XT
CATEGORY
Thin Film / Film Thickness
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Deinstalled
Product ID:
107077
Wafer Sizes:
8"/200mm, 12"/300mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Critical dimensions No missing parts Current Wafer size : 12Configuration
No ConfigurationOEM Model Description
In February 2006, KLA introduced the SpectraCD-XT—our fourth-generation of inline optical CD metrology systems for advanced patterning process control at the 90nm and 65nm nodes. SpectraCD-XT is a non-destructive dedicated CD and profile metrology system built on our high-throughput, production-proven Archer platform. The tool is the only high performance spectroscopic ellipsometry (SE)-basedDocuments
No documents