Description
Ox film thickness measurementConfiguration
Ellipsometer is includedOEM Model Description
The NanoSpec 8000XSE is a stand-alone, automated thin film measurement system that can handle wafers ranging in size from 75 to 200 millimeters in diameter. It includes a fully integrated spectroscopic ellipsometer for ultrathin and multiple film stack measurement applications. An FTIR option can be added to measure the thickness of epi-silicon. The 8000XSE also offers a standard mechanical interface with mini-environment enclosures for use in ultra-clean manufacturing facilities and can be configured to handle substrates used in the magnetic recording head industry.Documents
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ONTO / NANOMETRICS / ACCENT / BIO-RAD
NANOSPEC 8000XSE
Verified
CATEGORY
Thin Film / Film Thickness
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
74807
Wafer Sizes:
8"/200mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Similar Listings
View AllONTO / NANOMETRICS / ACCENT / BIO-RAD
NANOSPEC 8000XSE
CATEGORY
Thin Film / Film Thickness
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
74807
Wafer Sizes:
8"/200mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Ox film thickness measurementConfiguration
Ellipsometer is includedOEM Model Description
The NanoSpec 8000XSE is a stand-alone, automated thin film measurement system that can handle wafers ranging in size from 75 to 200 millimeters in diameter. It includes a fully integrated spectroscopic ellipsometer for ultrathin and multiple film stack measurement applications. An FTIR option can be added to measure the thickness of epi-silicon. The 8000XSE also offers a standard mechanical interface with mini-environment enclosures for use in ultra-clean manufacturing facilities and can be configured to handle substrates used in the magnetic recording head industry.Documents
No documents