Description
Nanometrics Nanospec 4150 Film Thickness MeasureConfiguration
Automatic Stage & Stage controller with twin chuck (4 ~ 8" wafer size) UV lamp housing & Deuterium Lamp Power Supply Auto focus : Not available (Image capture board to be repaired) Wavelength : Visible 400~900nm , 200~900nm with UV (option) Accuracy : Within ± 1% (Oxide Standard) Precision : 2Å, 500~50,000Å Visible /1Å, 25~500Å UV option Stability : 0.5% or 5Å or whichever is greater Data analysis : Mapping contour 2D and 3D / Statistical Process Control (SPC)OEM Model Description
The Model 4150, an enhanced version of the Model 4100 introduced in the middle of 1994, provides automated stage and focusing systems for hands-off uniformity maps.Documents
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ONTO / NANOMETRICS / ACCENT / BIO-RAD
NANOSPEC 4150
Verified
CATEGORY
Thin Film / Film Thickness
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
17226
Wafer Sizes:
8"/200mm
Vintage:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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ONTO / NANOMETRICS / ACCENT / BIO-RAD
NANOSPEC 4150
CATEGORY
Thin Film / Film Thickness
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
17226
Wafer Sizes:
8"/200mm
Vintage:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Nanometrics Nanospec 4150 Film Thickness MeasureConfiguration
Automatic Stage & Stage controller with twin chuck (4 ~ 8" wafer size) UV lamp housing & Deuterium Lamp Power Supply Auto focus : Not available (Image capture board to be repaired) Wavelength : Visible 400~900nm , 200~900nm with UV (option) Accuracy : Within ± 1% (Oxide Standard) Precision : 2Å, 500~50,000Å Visible /1Å, 25~500Å UV option Stability : 0.5% or 5Å or whichever is greater Data analysis : Mapping contour 2D and 3D / Statistical Process Control (SPC)OEM Model Description
The Model 4150, an enhanced version of the Model 4100 introduced in the middle of 1994, provides automated stage and focusing systems for hands-off uniformity maps.Documents
No documents