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6" Fab For Sale from Moov - Click Here to Learn More

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6" Fab For Sale from Moov - Click Here to Learn More

ONTO / NANOMETRICS / ACCENT / BIO-RAD NANOSPEC 2100

Description

Nanometrics Nanospec 2100 Film Thickness Measure

Configuration

*. Process: Film thickness measurement. - silicon dioxide on silicon 400~ 30,000 A. - photo resist on silicon 500~ 40,000 A. - other thin films. *. Hardware configuration: - Optical microscope & objectives 5x,10x,40x. - Spectrophotometer Head. - Microcomputer & Monitor. - Photo intensity Display & Wavelength counter. - Microscope Stage. *. Wavelength : 390~800 nm TungstenLamp 12V /50W.

OEM Model Description

75 mm to 200 mm substrates Variety of measurement modes Manual stage.

Documents

No documents

ONTO / NANOMETRICS / ACCENT / BIO-RAD

NANOSPEC 2100

verified-listing-icon

Verified

CATEGORY

Thin Film / Film Thickness

Last Verified: Over 60 days ago

Key Item Details

Condition:

Refurbished

Operational Status:

Unknown

Product ID:

66021

Wafer Sizes:

8"/200mm

Vintage:

1996

Have Additional Questions?

Logistics Support

Available

Money Back Guarantee

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

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listing-photo-c402784add4249558b20a80524850680-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c402784add4249558b20a80524850680/eb321799ea444c68900840561bdb0b2e_1_mw.png

listing-photo-c402784add4249558b20a80524850680-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c402784add4249558b20a80524850680/763505a7b838466f9786be5a3613533b_2_mw.png

listing-photo-c402784add4249558b20a80524850680-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c402784add4249558b20a80524850680/5516fc1eb9fd46d9b0ccaee74a293e54_spk3541_mw.jpg

listing-photo-c402784add4249558b20a80524850680-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c402784add4249558b20a80524850680/b806805610124460880575147c755e55_spk3542_mw.jpg

listing-photo-c402784add4249558b20a80524850680-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c402784add4249558b20a80524850680/82efd35d40e74157a5c55470b4762f7b_spk3544_mw.jpg

listing-photo-c402784add4249558b20a80524850680-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c402784add4249558b20a80524850680/944995a8ac8440968d8e78ce3b4dcb38_spk3543_mw.jpg

listing-photo-c402784add4249558b20a80524850680-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/c402784add4249558b20a80524850680/8d09adfc806c493fb036a96a5b76ce2c_spk3545_mw.jpg

Key Item Details

Condition:

Refurbished

Operational Status:

Unknown

Product ID:

66021

Wafer Sizes:

8"/200mm

Vintage:

1996

Have Additional Questions?

Logistics Support

Available

Money Back Guarantee

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

Description

Nanometrics Nanospec 2100 Film Thickness Measure

Configuration

*. Process: Film thickness measurement. - silicon dioxide on silicon 400~ 30,000 A. - photo resist on silicon 500~ 40,000 A. - other thin films. *. Hardware configuration: - Optical microscope & objectives 5x,10x,40x. - Spectrophotometer Head. - Microcomputer & Monitor. - Photo intensity Display & Wavelength counter. - Microscope Stage. *. Wavelength : 390~800 nm TungstenLamp 12V /50W.

OEM Model Description

75 mm to 200 mm substrates Variety of measurement modes Manual stage.

Documents

No documents

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